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In the semiconductor industry, the tube can be used as diffusion, diffusion source dish. In other industrial areas, can be used to heat lamp and purified using the reactor and piping.
Note: We can provide other specification products according to customer’s requirements.
product specification：
|
Technical Parameter: Impurity Mean Value |
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|
Al |
Fe |
Ca |
Mg |
Ti |
Cu |
Mn |
K |
Na |
Li |
Co |
Ni |
B |
|
|
21.32 |
0.94 |
1.88 |
0.29 |
0.54 |
0.05 |
0.05 |
0.4 |
2.06 |
1.66 |
＜0.07 |
＜0.07 |
0.16 |
|
|
Product Size: |
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|
OD |
Tolerance |
Wall Thickness |
Tolerance |
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|
19≤Ф＜35 |
±0.4 |
≥1.5 |
±10% |
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|
35≤Ф＜50 |
±0.7 |
||||||||||||
|
50≤Ф＜60 |
±1 |
2-10 |
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|
60≤Ф＜100 |
±1.2 |
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|
100≤Ф＜140 |
±1.5 |
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|
140≤Ф＜160 |
±1.8 |
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|
160≤Ф＜220 |
±2 |
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|
220≤Ф＜280 |
±4 |
2.5-4 |
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l Optical communication industry
l Semiconductor industry
l Laser light industry
l Radiation light industry
l Chemical industry
l Medical environmental protection industry
